Process integration engineers are gradually losing their battle to keep process variations hidden behind the defensive barrier of tight design rules. Variations in metal line widths, layer thicknesses ...

Over the years, semiconductor process nodes have been scaled aggressively, with device dimensions now approaching below 5nm. This, along with lower device operating voltages and currents, has allowed ...

Usually when it comes to writing, mathematics and statistics probably aren’t the first things that come to mind. However, quite the number of us have had to face an instance where a source based on ...

Variation is becoming a major headache at advanced nodes, and issues that used to be dealt with in the fab now must be dealt with on the design side, as well. What is fundamentally changing is that ...

Eight characters were measured on specimens of Pimephales promelas from 54 localities. Each character was subjected to an analysis of variance or covariance, a Student-Newman-Keuls multiple ...