SANTA CLARA, Calif., April 20, 2015 - Applied Materials today announced the Applied Centura ® Tetra (TM) Z Photomask Etch system for etching next-generation optical lithographic photomasks needed by ...
TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...
SAN JOSE, Calif. — The demise of Etec Systems, the once dominant supplier of semiconductor photomask pattern generators that was quietly shut down by parent company Applied Materials last October, ...
Semiconductor Engineering sat down to discuss photomask technologies with Naoya Hayashi, research fellow at Dai Nippon Printing (DNP); Banqiu Wu, principal member of the technical staff and chief ...
TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...
San Jose, Calif. — When Etec Systems Inc., the once-dominant supplier of semiconductor photomask pattern generators, quietly shut down last October, it left only one viable supplier of laser tools, ...
Heidelberg, Germany – Heidelberg Instruments has secured two major orders for its VPG + 1400 FPD Volume Pattern Generator from leading photomask manufacturers in Asia, with a total order value between ...
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