Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Pattern matching is best known for its use in detecting lithographic hotspots, but it’s also widely used across all physical verification flows, and has expanded into design-for-manufacturing (DFM) ...

As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...

Python, for all its power and popularity, has long lacked a form of flow control found in other languages—a way to take a value and match it elegantly against one of a number of possible conditions.

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...

HOUSTON – (Sept. 27, 2023) Rice University computer scientists have won two grants from the National Science Foundation to explore new information processing technologies and applications that combine ...

Take advantage of the new relational and logical patterns in C# 9.0 to make your code more readable, maintainable, and efficient. Pattern matching is a great feature first introduced in C# 7. You can ...