Michael Kanellos is editor at large at CNET News.com, where he covers hardware, research and development, start-ups and the tech industry overseas. Georgia Tech and Sandia National Labs have come out ...

Molecular Imprints, Inc. (MII), the leader in nano-imprint lithography, unveiled the latest addition to its Imprio line of imprint lithography tools today at the Strategies in Light trade conference.

Step-and-repeat nanoimprint lithography (NIL) is a promising technique to replicate nanoscale patterns at low cost across a large area. Last year, researchers Christophe Peroz and Scott Dhuey and ...

“The semiconductor equipment and manufacturer supply chain must have early access to high quality, fully patterned 450mm wafers in order to develop and optimize their products and processes in time ...

GARCHING, Germany & WINDACH, Germany--(BUSINESS WIRE)--SUSS MicroTec and DELO cooperate in the optimization of imprint manufacturing processes for the production of wafer-level optics (WLO). These ...

The announcement on Feb. 13 of the acquisition of the semiconductor arm of Molecular Imprints (MII) by Canon is a seminal event in the story of imprint patterning. Full disclosure requires me to ...

LONDON — Suss MicroTec AG has developed a nano-imprint lithography tool. The NPS300 NanoPatterning Stepper was developed within the Sixth Framework Program in cooperation with the VTT Microelectronics ...

Dip Pen Nanolithography (DPN), a direct-write soft lithography method, is used to develop nanostructures on a preferred substrate by offering sets of molecules through capillary transport from an ...

Invented 20 years ago, nanoimprint lithography offers a powerful manufacturing alternative for the semiconductor and other nanotechnology sectors, says Helmut Schift Pressing matter A technician from ...

GARCHING, Germany & BERLIN--(BUSINESS WIRE)--SUSS MicroTec, leading supplier of equipment and process solutions for the semiconductor industry, and micro resist technology GmbH, a leading company for ...

Nano-imprint lithography (NIL), a polymer stamping process, looms as the next revolutionary way to get past the limitations of conventional photolithography. Although this technology is still in its ...